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直播回放 | 光斑尺寸可調的高均勻性線光斑半導體激光器系統
Time:2023-09-18
2023年9月21日周四19:30,炬光科技光機系統技術專家華大成在光電匯直播平臺“光言萬物”發表題為《光斑尺寸可調的高均勻性線光斑半導體激光器系統》的專題演講。
報告摘要
晶圓激光退火(Wafer Laser Annealing)是28nm及以下邏輯芯片制造前道工序中不可缺少的關鍵工藝之一。該工藝采用近紅外波段半導體激光光源,通過多組不同功能的激光光學整形系統及光學勻化系統,在工作距離下達成12mm*70μm的極窄線激光光斑,將形成的高能量密度極窄激光光斑照射到晶圓表面,在不到1毫秒的時間內將表層原子層加熱到1000°C以上再急速冷卻,使晶(jing)圓表(biao)面(mian)局部形成超淺(qian)結和高激(ji)活結,從(cong)而有效減少(shao)前道工(gong)序(xu)中產(chan)生的晶(jing)圓電極缺陷,提高產(chan)品性能,提升晶(jing)圓生產(chan)良(liang)品率。
炬光科技推出的DLight?S系列半導體集成電路晶圓退火系統,結合產生光子的共晶鍵合技術、激光光源熱管理技術、熱應力控制技術以及調控光子的激光光束轉換技術和光場勻化技術,產生一條長寬比達160:1的近紅外波段極窄線光斑,并在光斑長度方向達到>95%的能量均勻性和>98%的能量穩定性。應用在半導體前道工序中的多種退火工藝。

DLight?S系(xi)列半導體集成電路晶圓退火系(xi)統
演講人信息

華大成,浙江大學光(guang)(guang)學工程碩士畢業,光(guang)(guang)機系統(tong)技術專(zhuan)家,2019年加入炬(ju)光(guang)(guang)科(ke)技,長期從(cong)事高(gao)精(jing)密線(xian)光(guang)(guang)斑激光(guang)(guang)系統(tong)開發工作。
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